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Agfa structurix pmc strip
Agfa structurix pmc strip








agfa structurix pmc strip

Wherein R 1 is selected from the group consisting of hydrogen, an alkyl group, an aryl group or a heteroaryl group L is a divalent linking group A is selected from the group consisting of hydrogen, a metallic or organic counterion or a group capable of generating a thiol upon hydrolysis.Ĥ. A processing solution according to claim 1, wherein the polymeric compound comprises an ethylenically unsatured monomer according to general formula I

agfa structurix pmc strip

A processing solution according to claim 1, wherein said polymeric compound comprises at least one monomer unit having a solubilizing group selected from the group consisting of a carboxylic acid or salt thereof, a sulfonic acid or salt thereof, a phosphonic acid or salt thereof, a phosphate or a sulfate.ģ. A silver halide photographic processing solution comprising at least one polymeric compound, wherein said polymeric compound comprises at least one monomer unit having a silver complexing moiety selected from the group consisting of a thiol or salt thereof, a group capable of generating a thiol by hydrolysis or a disulfide and at least one monomer unit having a solubilizing group, and wherein both said silver ion completing moiety and said solubilizing group are comprised in same or different monomer units.Ģ.










Agfa structurix pmc strip